Combined BEM/FEM vs. 3DFEM Substrate Resistance Modeling
نویسنده
چکیده
In the context of substrate resistance modeling a combined BEM/FEM method is compared to a 3DFEM method. The combined BEM/FEM method is applicable in substrate modeling problems which involve layout-dependent doping patterns for which a standalone BEM would not be accurate enough and for which a standalone FEM would be too slow. The method captures local couplings within the doping pattern with the FEM, and global couplings through the deep substrate with the BEM. Simulations show that combined BEM/FEM is an appropriate crossover between the BEM and FEM methods. Combined BEM/FEM can be very efficient as the FEM domain is kept small, while a coarse and sparse BEM for the deep substrate is sufficient for accuracy.
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